SUPPORT

IC Series

Model IC - 10

Specification
Chamber Type Tube type( 2 ~ 8 inch)
Substrate Temperature Up to 450 ℃
Precursor sources Up to 3
Reactant H2O , O3 , O2 , NH3 Gas & Plasma
Equipment size 1500 × 1000 × 1500 mm
Control system PC control (auto)

*Available for attaching loadlock chamber.

ISH Series

MODEL : ISH-10

Specification
Chamber Type Wafer(shower head) type( 6 inch)
Substrate Temperature Up to 450 ℃
Precursor sources Up to 3
Reactant H2O , O3 , O2 , NH3 Gas & Plasma
Equipment size 1500 × 1200 × 1500 mm
Control system PC control (auto)